Chemical Etching

Chemical etching is the Process selectively removes material from a substrate to create precise patterns. First, the substrate is cleaned to remove contaminants. Then, a masking is applied and patterned to protect certain areas. The substrate is immersed in an etching solution, which selectively reacts with the exposed areas, dissolving them. After etching, the substrate is rinsed and the masking is stripped, leaving behind the desired pattern. This process can be done using wet etching with liquid solutions.
Chemical etching offers several advantages, including high precision, repeatability, and the ability to create complex patterns with high aspect ratios.